Dependence of field effect mobilities on substrate temperature for amorphous silicon deposition for amorphous silicon thin film transistors

被引：0
|
作者：
Oyoshi, Keiji [1 ]
Yamaoka, Tomonori [1 ]
Tanaka, Shuhei [1 ]
机构：
[1] Nippon Sheet Glass Co, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 11期
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摘要：
4
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页码：2010 / 2012
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