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- [2] Proceedings of SPIE - Photomask and Next-Generation Lithography Mask Technology XI - Part-One PMJ - Photomask Japan; BACUS - The International Technical Group of SPIE; SPIE - International Society for Optical Engineering (SPIE):
- [3] Erratum: (Photomask and Next-Generation Lithography Mask Technology IX (23-25 April 2002)) 1600, PMJ-Photomask Japan; BACUS-intl. technical group of SPIE; SPIE (The International Society for Optical Engineering):
- [4] Mask availability for next-generation lithography 18TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2002, 4764 : 18 - 22
- [5] Photomask technology - Mask makers contemplate the next generation LASER FOCUS WORLD, 2003, 39 (11): : 41 - +
- [8] Photomask process development for next generation lithography Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2, 2005, 5853 : 277 - 288
- [10] Process technology for next generation photomask JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12B): : 6669 - 6674