Proceedings of SPIE - Photomask and Next-Generation Lithography Mask Technology XII

被引：0
|
作者：
机构：
来源：
| / SPIE - The International Society for Optical Engineering卷 / SPIE期
关键词：
714.2 Semiconductor Devices and Integrated Circuits - 723 Computer Software; Data Handling and Applications - 801.3 Colloid Chemistry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Mask process proximity correction for next-generation mask fabrication
    Kim, SH
    Choi, SW
    Sohn, JM
    Park, JR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 3041 - 3045
  • [32] NEXT-GENERATION LITHOGRAPHY Making a good impression
    Kreindl, Gerald
    Glinsner, Thomas
    Miller, Ron
    NATURE PHOTONICS, 2010, 4 (01) : 27 - 28
  • [33] Next-generation lithography tools: The choices narrow
    DeJule, Ruth
    Semiconductor International, 1999, 22 (03):
  • [34] Europeans collaborate toward next-generation lithography
    Ceccotti, T
    LASER FOCUS WORLD, 2004, 40 (02): : 58 - 59
  • [35] Particle contamination control technology in electron beam mask writing system for next-generation mask fabrication
    Akeno, K
    Ogasawara, M
    Ooki, K
    Tojo, T
    Hirano, R
    Yoshitake, S
    Toriumi, M
    Sekine, A
    Takigawa, T
    Shinoda, T
    Noguchi, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (09): : 5835 - 5840
  • [36] Particle contamination control technology in electron beam mask writing system for next-generation mask fabrication
    Akeno, K
    Ogasawara, M
    Tojo, T
    Hirano, R
    Yoshitake, S
    Ooki, K
    Toriumi, M
    Sekine, A
    Takikawa, T
    Shinoda, T
    Noguchi, S
    MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 146 - 147
  • [37] Next-generation CANDU technology
    Hopwood, J
    Hedges, K
    Pakan, M
    NUCLEAR PLANT JOURNAL, 2002, 20 (05) : 35 - 38
  • [38] Next-generation reflow technology
    Suganuma, Hiro
    Tamanaha, Alvin
    SMT Surface Mount Technology Magazine, 2001, 15 (02): : 65 - 66
  • [39] FRAGRANCE TECHNOLOGY - THE NEXT-GENERATION
    COLWELL, SM
    SOAP COSMETICS CHEMICAL SPECIALTIES, 1993, 69 (08): : 30 - &
  • [40] Next-generation PC technology
    Kim, Chae-Kyu
    ETRI JOURNAL, 2007, 29 (03)
12345