Formation of Ti-Al-N films by an activated reactive evaporation (ARE) method

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作者：
Ide, Yukio [1 ]
Inada, Kazunori [1 ]
Nakamura, Takashi [1 ]
Maeda, Masafumi [1 ]
机构：
[1] Industrial Technology Inst Yamaguchi, Prefectural Government, Yamaguchi, Japan
来源：
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals | 1998年 / 62卷 / 01期
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页码：98 / 105
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