Large area radio frequency plasma for microelectronics processing

被引：0
|
作者：
机构：
[1] Yu, Z.
[2] Shaw, D.
[3] Gonzales, P.
[4] Collins, G.J.
来源：
Yu, Z. | 1600年 / AVS Science and Technology Society卷 / 13期
关键词：
Commercial processing - Dielectric windows - Gas-discharge plasmas - Inductive couplings - Inductively-coupled - Radial uniformities - Radio frequency plasma - Thin dielectric layer;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Very high frequency capacitively coupled discharges for large area processing
    Meyyappan, M
    Colgan, MJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (05): : 2790 - 2794
  • [42] Hydrogen/oxygen radio-frequency plasma processing of LiNbO3
    Turcicova, H
    Vacik, J
    Cervena, J
    Zelezny, V
    SPECIFICATION, PRODUCTION, AND TESTING OF OPTICAL COMPONENTS AND SYSTEMS, 1996, 2775 : 566 - 574
  • [43] Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
    Univ of Illinois, Urbana, United States
    IEEE Trans Plasma Sci, 5 (1329-1338):
  • [44] Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing
    Bárdos, L
    Baránková, H
    Welzel, T
    Dani, I
    Peter, S
    Richter, F
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (04) : 1703 - 1709
  • [45] Controller design issues in the feedback control of radio frequency plasma processing reactors
    Rauf, S
    Kushner, MJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (03): : 704 - 712
  • [46] A Novel Radio-Frequency Inductively Coupled Plasma Torch for Material Processing
    Patrick Mirek
    Sina Alavi
    Javad Mostaghimi
    Plasma Chemistry and Plasma Processing, 2021, 41 : 1547 - 1566
  • [47] Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
    Rauf, S
    Kushner, MJ
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (05) : 1329 - 1338
  • [48] Large Area Plasma Processing System based on electron beam ionization
    Leonhardt, D.
    Walton, S.G.
    Blackwell, D.B.
    Murphy, D.P.
    Fernsler, R.F.
    Meger, R.A.
    IEEE International Conference on Plasma Science, 2000,
  • [49] Theoretical overview of the large-area plasma processing system (LAPPS)
    Manheimer, WM
    Fernsler, RF
    Lampe, M
    Meger, RA
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (03): : 370 - 386
  • [50] MICROELECTRONICS PROCESSING
    HESS, DW
    JENSEN, KF
    ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 1 - 33
12345