Large area radio frequency plasma for microelectronics processing

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[1] Yu, Z.
[2] Shaw, D.
[3] Gonzales, P.
[4] Collins, G.J.
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Yu, Z. | 1600年 / AVS Science and Technology Society卷 / 13期
关键词：
Commercial processing - Dielectric windows - Gas-discharge plasmas - Inductive couplings - Inductively-coupled - Radial uniformities - Radio frequency plasma - Thin dielectric layer;
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