Large area radio frequency plasma for microelectronics processing

被引：0
|
作者：
机构：
[1] Yu, Z.
[2] Shaw, D.
[3] Gonzales, P.
[4] Collins, G.J.
来源：
Yu, Z. | 1600年 / AVS Science and Technology Society卷 / 13期
关键词：
Commercial processing - Dielectric windows - Gas-discharge plasmas - Inductive couplings - Inductively-coupled - Radial uniformities - Radio frequency plasma - Thin dielectric layer;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] LARGE-AREA RADIO-FREQUENCY PLASMA FOR MICROELECTRONICS PROCESSING
    YU, Z
    SHAW, D
    GONZALES, P
    COLLINS, GJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 871 - 874
  • [2] Use of radio frequency bias in the large area plasma processing system
    Manheimer, WM
    Lampe, M
    Fernsler, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (02): : 490 - 498
  • [3] Radio frequency inductive discharge source design for large area processing
    Wendt, AE
    Mahoney, LJ
    PURE AND APPLIED CHEMISTRY, 1996, 68 (05) : 1055 - 1058
  • [4] Large-area radio frequency plasma sources for fusion applications
    Kraus, W
    Speth, E
    Feist, JH
    Frank, P
    Heinemann, B
    Riedl, R
    Trainham, R
    Jacquot, C
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (02): : 956 - 958
  • [5] Radio frequency atmospheric plasma source on a printed circuit board for large area, uniform processing of polymeric materials
    Dimitrakellis, P.
    Zeniou, A.
    Stratakos, Y.
    Gogolides, E.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (02):
  • [6] Large-area laser-lift-off processing in microelectronics
    Delmdahl, R.
    Paetzel, R.
    Brune, J.
    LASERS IN MANUFACTURING (LIM 2013), 2013, 41 : 241 - 248
  • [7] Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors
    Sansonnens, L
    Strahm, B
    Derendinger, L
    Howling, AA
    Hollenstein, C
    Ellert, C
    Schmitt, JPM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (04): : 922 - 926
  • [8] Nonuniform radio-frequency plasma potential due to edge asymmetry in large-area radio-frequency reactors
    Howling, AA
    Sansonnens, L
    Ballutaud, J
    Hollenstein, C
    Schmitt, JPM
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (10) : 5429 - 5440
  • [9] Radio frequency hollow cathode source for large area cold atmospheric plasma applications
    Bárdos, L
    Baránková, H
    SURFACE & COATINGS TECHNOLOGY, 2000, 133 : 522 - 527
  • [10] Study of a scalable large-area radio-frequency helicon plasma source
    Windisch, T.
    Rahbarnia, K.
    Grulke, O.
    Klinger, T.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (05):
12345