REACTIVE ION BEAM ETCHING AND ITS APPLICATION.

被引：0
|
作者：
Jin Weixin
Meng Xianguang
You Dawei
Xu Xingcai
机构：
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 1983年 / 4卷 / 01期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
3
引用
收藏
页码：97 / 100
相关论文
共 50 条
  • [1] Reactive ion beam etching of lithium tantalate and its application for pyroelectric infrared detectors
    Plehnert, Corinna
    Norkus, Volkmar
    Moehling, Silke
    Hayes, Alan
    [J]. SURFACE & COATINGS TECHNOLOGY, 1995, 74-75 (1-3): : 932 - 936
  • [2] Dry etching of GaN using reactive ion beam etching and chemically assisted reactive ion beam etching
    Lee, JW
    Park, HS
    Park, YJ
    Yoo, MC
    Kim, TI
    Kim, HS
    Yeom, GY
    [J]. GALLIUM NITRIDE AND RELATED MATERIALS II, 1997, 468 : 373 - 377
  • [3] Silver patterning by reactive ion beam etching for microelectronics application
    Gao, L
    Gstoettner, J
    Emling, R
    Wang, P
    Hansch, W
    Schmitt-Landsiedel, D
    [J]. MATERIALS, TECHNOLOGY AND RELIABILITY FOR ADVANCED INTERCONNECTS AND LOW-K DIELECTRICS-2004, 2004, 812 : 185 - 190
  • [4] Reactive ion etching and ion beam etching for ferroelectric memories
    Shao, TQ
    Ren, TL
    Liu, LT
    Zhu, J
    Li, ZJ
    [J]. INTEGRATED FERROELECTRICS, 2004, 61 : 213 - 220
  • [5] REACTIVE ION-BEAM ETCHING.
    Heath, B.A.
    Mayer, T.M.
    [J]. VLSI Electronics, Microstructure Science, 1984, 8 : 365 - 409
  • [6] INTRODUCTION TO REACTIVE ION-BEAM ETCHING
    DOWNEY, DF
    BOTTOMS, WR
    HANLEY, PR
    [J]. SOLID STATE TECHNOLOGY, 1981, 24 (02) : 121 - 127
  • [7] VLSI REACTIVE ION-BEAM ETCHING
    CUSTODE, FZ
    FEWER, W
    SPLINTER, M
    DOWNEY, DF
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : C105 - C105
  • [8] ION-BEAM ETCHING WITH REACTIVE GASES
    BOLLINGER, LD
    [J]. SOLID STATE TECHNOLOGY, 1983, 26 (01) : 99 - 108
  • [9] Micromachining of optical fiber using reactive ion etching and its application
    [J]. Kumazaki, Hironori, 2000, (39):
  • [10] Micromachining of optical fiber using reactive ion etching and its application
    Kumazaki, H
    Yamada, Y
    Oshima, T
    Inaba, S
    Hane, K
    [J]. MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 154 - 155
12345