FINE PATTERN FABRICATION USING ION BEAM ETCHING.

被引：0
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作者：
Furuya, Shigeru
Kobayashi, Koichi
Yamamoto, Sumio
机构：
来源：
Fujitsu Scientific and Technical Journal | 1979年 / 15卷 / 04期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
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学科分类号：
摘要：
INTEGRATED CIRCUITS - Masks
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页码：111 / 120
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