FINE PATTERN FABRICATION USING ION BEAM ETCHING.

被引：0
|
作者：
Furuya, Shigeru
Kobayashi, Koichi
Yamamoto, Sumio
机构：
来源：
Fujitsu Scientific and Technical Journal | 1979年 / 15卷 / 04期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
INTEGRATED CIRCUITS - Masks
引用
收藏
页码：111 / 120
相关论文
共 50 条
  • [1] FINE PATTERN FABRICATION USING ION-BEAM ETCHING
    FURUYA, S
    KOBAYASHI, K
    YAMAMOTO, S
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1979, 15 (04): : 111 - 120
  • [2] FABRICATION OF SCHOTTKY DEVICES ON P-TYPE SILICON USING ION BEAM ETCHING.
    Auret, F.D.
    Bojarczuk, N.A.
    Paz, O.
    IBM technical disclosure bulletin, 1984, 27 (03):
  • [3] REACTIVE ION-BEAM ETCHING.
    Heath, B.A.
    Mayer, T.M.
    VLSI Electronics, Microstructure Science, 1984, 8 : 365 - 409
  • [4] MICROFABRICATION BY ION-BEAM ETCHING.
    Lee, Robert E.
    Semiconductor International, 1980, 3 (01): : 73 - 80
  • [5] ION-BEAM ASSISTED ETCHING.
    Kireev, V.Yu.
    Nazarov, D.A.
    Kuznetsov, V.I.
    Soviet surface engineering and applied electrochemistry, 1986, (06): : 52 - 57
  • [6] REACTIVE ION ETCHING.
    Gorowitz, Bernard
    Saia, Richard J.
    VLSI Electronics, Microstructure Science, 1984, 8 : 297 - 339
  • [7] GAAS AND ALGAAS ANISOTROPIC FINE PATTERN ETCHING USING A NEW REACTIVE ION-BEAM ETCHING SYSTEM
    ASAKAWA, K
    SUGATA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 402 - 405
  • [8] MICROFABRICATION OF HOLOGRAPHIC BLAZED GRATING BY REACTIVE ION BEAM ETCHING.
    Fu Xinding
    Zheng Yangfang
    Lizhi Cheng
    Congxin Ren
    Cai Xuegiang
    Qu Zhiming
    Xu Yinming
    Li Meiyue
    Guangxue Xuebao/Acta Optica Sinica, 1985, 5 (01): : 43 - 49
  • [9] ELECTRON BEAM TESTING OF VLSI CIRCUITS ASSISTED BY FOCUSED ION BEAM ETCHING.
    Arima, Hideaki
    Matsukawa, Takayuki
    Mitsuhashi, Junichi
    Morimoto, Hiroaki
    Nakata, Hidefumi
    Microelectronic Engineering, 1986, 4 (02) : 107 - 120
  • [10] PATTERN FABRICATION BY OBLIQUE-INCIDENCE ION-BEAM ETCHING
    GOKAN, H
    ESHO, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (01): : 23 - 27
12345