共 50 条
- [11] Strain-induced Anisotropy of electromigration in copper interconnect 2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2, 2007, : 391 - 392
- [15] A study of underlayer geometry effects on interconnect line characteristics through S-parameter measurements 51ST ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE, 2001, : 1290 - 1294
- [16] Improved resistance to electromigration and acoustomigration of Al interdigital transducers by Ni underlayer Rare Metals, 2018, 37 : 823 - 830
- [18] Effect of aluminum seed layer on the crystallographic texture and electromigration resistance of physical vapor deposited copper interconnect JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (12A): : 6708 - 6715
- [20] Upstream Electromigration Study on Multiple Via Structures in Copper Interconnect PROCEEDINGS OF THE 2009 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2009, : 86 - 88