Design and fabrication of microsensors using standard CMOS IC process

被引：0
|
作者：
Dai, Ching-Liang [1 ]
Chang, Pei-Zen [1 ]
Wang, Jiann-Jenn [1 ]
机构：
[1] Natl Taiwan Univ, Taipei, Taiwan
来源：
Journal of the Chinese Society of Mechanical Engineers, Transactions of the Chinese Institute of Engineers, Series C/Chung-Kuo Chi Hsueh Kung Ch'eng Hsuebo Pao | 1997年 / 18卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：283 / 291
相关论文
共 50 条
  • [21] Cost Effective High-Voltage IC Technology Implemented in a Standard CMOS Process
    Park, Jong Mun
    Minixhofer, Rainer
    Schrems, Martin
    EKC 2010: PROCEEDINGS OF THE EU-KOREA CONFERENCE ON SCIENCE AND TECHNOLOGY, 2011, 138 : 97 - 105
  • [22] Fabrication of SIMOS/SOI CMOS IC'S
    Wen, M.Q.
    Beijing Hangkong Hangtian Daxue Xuebao/Journal of Beijing University of Aeronautics and Astronautics, 2001, 27 (01): : 109 - 111
  • [23] Design and Evaluation of Filterless RGB Sensor on Standard CMOS Process
    Sugiura, Takaya
    Miura, Hiroki
    Nakano, Nobuhiko
    IEEE PHOTONICS JOURNAL, 2022, 14 (03):
  • [24] Design and implementation of an optoelectronic integrated receiver in standard CMOS process
    Yu, Changliang
    Mao, Luhong
    Song, Ruiliang
    Zhu, Haobo
    Wang, Rui
    Wang, Qian
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2007, 28 (08): : 1198 - 1203
  • [25] Simulation and design of Si-photodetector in standard CMOS process
    Bian, Jian-Tao
    Chen, Chao
    Bandaoti Guangdian/Semiconductor Optoelectronics, 2006, 27 (02): : 128 - 132
  • [26] Design and fabrication of Schottky diodes in 1.2 μm CMOS process
    de la Cruz-Alejo, Jesus
    Noe Oliva-Moreno, L.
    Santiago Medina-Vazquez, A.
    20TH INTERNATIONAL CONFERENCE ON ELECTRONICS COMMUNICATIONS AND COMPUTERS (CONIELECOMP 2010), 2010, : 5 - 8
  • [27] Process Development for CMOS fabrication using Minimal Fab
    Khumpuang, Sommawan
    Koga, Kazuhiro
    Liu, Yongxun
    Hara, Shiro
    2017 IEEE ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM), 2017, : 82 - 83
  • [28] Fabrication of the planar angular rotator using the CMOS process
    Chen, Hunglin
    Chang, Chienliu
    Yen, Kaihsiang
    Huang, Huiwen
    Chio, Jinhung
    Wu, Chingyi
    Chang, Peizen
    2000, IEEE, Piscataway, NJ, United States
  • [29] Fabrication of diffractive optical elements using the CMOS process
    Dai, CL
    Chen, HL
    Lee, CY
    Chang, PZ
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2002, 12 (01) : 21 - 25
  • [30] Fabrication of the planar angular rotator using the CMOS process
    Dai, CL
    Chang, CL
    Chen, HL
    Chang, PZ
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2002, 12 (03) : 247 - 251
12345