Design and fabrication of microsensors using standard CMOS IC process

被引：0
|
作者：
Dai, Ching-Liang [1 ]
Chang, Pei-Zen [1 ]
Wang, Jiann-Jenn [1 ]
机构：
[1] Natl Taiwan Univ, Taipei, Taiwan
来源：
Journal of the Chinese Society of Mechanical Engineers, Transactions of the Chinese Institute of Engineers, Series C/Chung-Kuo Chi Hsueh Kung Ch'eng Hsuebo Pao | 1997年 / 18卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：283 / 291
相关论文
共 50 条
  • [1] Design and fabrication of an ECG amplifier on silicon using standard CMOS process
    Rowlands, D
    James, DA
    Vanegas, C
    Rao, S
    Lisner, P
    PROCEEDINGS OF THE IEEE SENSORS 2003, VOLS 1 AND 2, 2003, : 1348 - 1352
  • [2] Design and Fabrication of CMOS-Integrated Thermoelectric IR Microsensors
    Lin, Keng-Shuen
    Chen, Rongshun
    2008 IEEE/LEOS INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS, 2008, : 106 - 107
  • [3] USE OF STANDARD CMOS POLYSILICON FOR MICROSENSORS
    PARAMESWARAN, M
    BALTES, HP
    HELVETICA PHYSICA ACTA, 1988, 61 (06): : 881 - 884
  • [4] Fabrication Methodology of microlenses for stereoscopic imagers using standard CMOS process
    Rocha, R. P.
    Carmo, J. P.
    Correia, J. H.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2012, 2012, 49 (01): : 323 - 330
  • [5] Investigation of compatibility of ferroelectric capacitor fabrication process with standard CMOS fabrication process
    Zhai, Ya-Hong
    Li, Ping
    Zhang, Shu-Ren
    Yang, Cheng-Tao
    Ruan, Ai-Wu
    Cai, Dao-Lin
    Ouyang, Fan
    Chen, Yan-Yu
    2007, Sichuan Institute of Piezoelectric and Acoustooptic Technology, Yongchuan Chongqing, 632164, China (29):
  • [6] Design and fabrication of the driving circuits for one-chip FED on the standard CMOS process
    Lee, JD
    Nam, JH
    Kwon, YI
    Park, BG
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2002, 40 (04) : 592 - 594
  • [7] Design and processing of integrated micro accelerometers using standard CMOS process
    Dai, CL
    Lu, SS
    Chang, PZ
    JOURNAL OF THE CHINESE INSTITUTE OF ENGINEERS, 1997, 20 (01) : 47 - 55
  • [8] Design of solar cell for micro system using standard CMOS process
    Zenibayashi D.
    Sugiura T.
    Nakano N.
    IEEJ Transactions on Sensors and Micromachines, 2019, 139 (08) : 252 - 257
  • [9] Resonant magnetic field microsensors in standard CMOS technology
    Baglio, S
    Latorre, L
    Nouet, P
    IMTC/99: PROCEEDINGS OF THE 16TH IEEE INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE, VOLS. 1-3, 1999, : 452 - 457
  • [10] Fabrication and Characterization of CMOS-MEMS Magnetic Microsensors
    Hsieh, Chen-Hsuan
    Dai, Ching-Liang
    Yang, Ming-Zhi
    SENSORS, 2013, 13 (11) : 14728 - 14739
12345