Electron cyclotron resonance devices with permanent magnets for production of large-diameter uniform plasmas

被引：0
|
作者：
Iizuka, Satoru [1 ]
Sato, Noriyoshi [1 ]
机构：
[1] Tohoku Univ, Sendai, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 7 B期
关键词：
Device symmetry - Electron cyclotron resonance devices - Large diameter uniform plasmas - Magnet arrangement - Microwave coupling - Plasma drift direction - Plasma processing;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：4221 / 4225
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