Low-ohmic contacts by excimer laser annealing of implanted polysilicon

被引:0
|
作者
Ren, Q.W. [1 ]
van den Berg, M.R. [1 ]
Nanver, L.K. [1 ]
Slabbekoorn, J. [1 ]
Visser, C.C.G. [1 ]
机构
[1] Delft Univ of Technology, Delft, Netherlands
来源
International Conference on Solid-State and Integrated Circuit Technology Proceedings | 1998年
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:102 / 105
相关论文
共 50 条
  • [21] Automated low-ohmic resistance measurements at the μΩ/Ω level
    Houtzager, Ernest
    Rietveld, Gert
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2007, 56 (02) : 406 - 409
  • [22] LASER RECRYSTALLIZATION AND HYDROGEN PLASMA ANNEALING OF ION-IMPLANTED POLYSILICON
    FANG, F
    LIN, CL
    SHEN, ZY
    TSOU, SC
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR): : 348 - 351
  • [23] EXCIMER LASER ANNEALED GOLD AND SILVER OHMIC CONTACTS ON N+-GAAS
    SIRCAR, P
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1986, 97 (01): : K69 - &
  • [24] Low resistance nonalloyed Ni/Au Ohmic contacts to p-GaN irradiated by KrF excimer laser
    Oh, Min-Suk
    Hwang, Dae-Kue
    Lim, Jae-Hong
    Kang, Chang-Goo
    Park, Seong-Ju
    APPLIED PHYSICS LETTERS, 2006, 89 (04)
  • [25] Luminescence of a-screw dislocations in low-ohmic GaN
    Medvedev, O. S.
    Vyvenko, O. F.
    Bondarenko, A. S.
    17TH RUSSIAN YOUTH CONFERENCE ON PHYSICS OF SEMICONDUCTORS AND NANOSTRUCTURES, OPTO- AND NANOELECTRONICS (RYCPS 2015), 2016, 690
  • [26] Low-Ohmic Contacting of Laser-Doped p-Type Silicon Surfaces with Pure Ag Screen-Printed and Fired Contacts
    Lohmueller, Elmar
    Werner, Sabrina
    Norouzi, Mohammad Hassan
    Gutscher, Simon
    Demant, Matthias
    Saint-Cast, Pierre
    Linse, Michael
    Bitnar, Bernd
    Palinginis, Phedon
    Neuhaus, Holger
    Wolf, Andreas
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2017, 214 (12):
  • [27] Evolution of implanted carbon in silicon upon pulsed excimer laser annealing
    Kantor, Z
    Fogarassy, E
    Grob, A
    Grob, JJ
    Muller, D
    Prevot, B
    Stuck, R
    APPLIED PHYSICS LETTERS, 1996, 69 (07) : 969 - 971
  • [28] Excimer laser annealing of B and BF2 implanted Si
    Monakhov, EV
    Svensson, BG
    Linnarsson, MK
    La Magna, A
    Italia, M
    Privitera, V
    Fortunato, G
    Cuscunà, M
    Mariucci, L
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2005, 124 : 232 - 234
  • [29] 300-W XeCl excimer laser annealing and sequential lateral solidification in low-temperature polysilicon technology
    Fechner, B
    Schiwek, M
    Kahlert, HJ
    Kobayashi, N
    THIRD INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2003, 4830 : 283 - 286
  • [30] Single shot excimer laser annealing of amorphous silicon: Effect of hydrogen on the properties of the polysilicon
    Boher, P
    Stehle, M
    Godard, B
    Stehle, JL
    ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS, 1996, 397 : 417 - 422