Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets

被引：0
|
作者：
Ichiki, Takanori [1 ,2 ]
Taura, Ryo [1 ]
Horiike, Yasuhiro [3 ]
机构：
[1] Dept. of Elec. and Electronic Eng., Toyo University, 2100 Kujirai, Kawagoe, Saitama 350-8585, Japan
[2] PRESTO, Japan Science and Technology Agency, Kawaguchi Ctr Bldg 1-8 Honcho 4chome, Kawaguchi City, 332-0012, Japan
[3] Department of Materials Science, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
来源：
Journal of Applied Physics | 2004年 / 95卷 / 01期
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摘要：
(Edited Abstract)
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页码：35 / 39
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