Characterization of GeSi/Si heteroepitaxial layered structures by convergent beam electron diffraction

被引：0
|
作者：
Shao, G. [1 ]
Yang, Z. [1 ]
Weiss, B.L. [1 ]
机构：
[1] Univ of Surrey, Guildford, United Kingdom
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 1 B期
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页码：404 / 407
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