Interaction of low NO2 concentrations in air with degenerate nanocrystalline tin dioxide thin films

被引:0
|
作者
Universidad Complutense de Madrid, Madrid, Spain [1 ]
机构
来源
Sens Actuators, B Chem | / 1-2卷 / 93-98期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
19
引用
收藏
相关论文
共 50 条
  • [41] CHARACTERIZATION OF CdS NANOCRYSTALLINE THIN FILMS GROWN BY CBD TECHNIQUE AT VERY LOW SOLUTION CONCENTRATIONS
    Rizwan, Z.
    Zakaria, A.
    Sabri, M. G. M.
    Din, Fasih Ud
    Zamiri, Reza
    Noroozi, Monir
    Norizom, M.
    CHALCOGENIDE LETTERS, 2010, 7 (07): : 471 - 476
  • [42] INTERACTION OF NO2 WITH A TIN-LEAD ALLOY
    TOMPKINS, HG
    SURFACE SCIENCE, 1972, 32 (02) : 269 - &
  • [43] Unprecedented coloration of rutile titanium dioxide nanocrystalline thin films
    Mane, Rajaram S.
    Joo, Oh-Shim
    Lee, Won Joo
    Han, Sung-Hwan
    MICRON, 2007, 38 (01) : 85 - 90
  • [44] Microstructure of nanocrystalline titanium dioxide thin films deposited on silicon
    Domaradzki, J
    Prociow, EL
    Kaczmarek, D
    Mielcarek, W
    ASDAM 2004: THE FIFTH INTERNATIONAL CONFERENCE ON ADVANCED SEMICONDUCTOR DEVICES AND MICROSYSTEMS, 2004, : 119 - 122
  • [45] Microwave dielectric behavior of nanocrystalline titanium dioxide thin films
    Pamu, D.
    Sudheendran, K.
    Krishna, M. Ghanashyam
    Raju, K. C. James
    Bhatnagar, Anil K.
    VACUUM, 2007, 81 (05) : 686 - 694
  • [46] Ambient temperature growth of nanocrystalline titanium dioxide thin films
    Pamu, D
    Krishna, MG
    Raju, KCJ
    Bhatnagar, AK
    SOLID STATE COMMUNICATIONS, 2005, 135 (1-2) : 7 - 10
  • [47] Low-Temperature One-Pot Synthesis of Tin(II) Sulfide Nanocrystalline Thin Films
    Kozhevnikova, N. S.
    Maskaeva, L. N.
    Enyashin, A. N.
    Lipina, O. A.
    Tyutyunnnik, A. P.
    Selyanin, I. O.
    Baklanova, I. V.
    Kuznetsov, M. V.
    Markov, V. F.
    RUSSIAN JOURNAL OF INORGANIC CHEMISTRY, 2024, 69 (01) : 1 - 10
  • [48] Correlating point defects with mechanical properties in nanocrystalline TiN thin films
    Zhang, Zaoli
    Ghasemi, Arsham
    Koutna, Nikola
    Xu, Zhen
    Gruenstaeudl, Thomas
    Song, Kexing
    Holec, David
    He, Yunbin
    Mayrhofer, Paul H.
    Bartosik, Matthias
    MATERIALS & DESIGN, 2021, 207
  • [49] Low pressure MOCVD of TiN thin films
    Kim, SW
    Jimba, H
    Sekiguchi, A
    Okada, O
    Hosokawa, N
    APPLIED SURFACE SCIENCE, 1996, 100 : 546 - 550
  • [50] Nanocrystalline tin oxide thin films via liquid flow deposition
    Supothina, S
    De Guire, MR
    Heuer, AH
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2003, 86 (12) : 2074 - 2081