Microstructure of nanocrystalline titanium dioxide thin films deposited on silicon

被引：0
|
作者：
Domaradzki, J [1 ]
Prociow, EL [1 ]
Kaczmarek, D [1 ]
Mielcarek, W [1 ]
机构：
[1] Wroclaw Univ Technol, Fac Microsyst Elect & Photon, PL-50372 Wroclaw, Poland
来源：
ASDAM 2004: THE FIFTH INTERNATIONAL CONFERENCE ON ADVANCED SEMICONDUCTOR DEVICES AND MICROSYSTEMS | 2004年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In present paper results of structural investigations of thin films of titanium dioxide (TiO2) manufactured by modified magnetron sputtering process have been outlined. XRD studies have shown that application of monocrystalline silicon wafers ensured fabrication of thin films with a high quality nanocrystalline structure with average size of grains in the range of (20 divided by 50) nm. It was stated that thin films fabricated by the modified method of magnetron sputtering were contracted at some preferred directions.
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页码：119 / 122
页数：4
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