QUANTITATIVE MEASUREMENT OF FILM THICKNESS, DENSITY AND STOICHIOMETRY OF MULTILAYER THIN FILMS ON THICK SUBSTRATES.

被引：0
|
作者：
Hichwa, B.P. [1 ]
机构：
[1] Donnelly Corp, Holland, MI, USA, Donnelly Corp, Holland, MI, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B24-25卷 / pt 1 Apr III期
关键词：
SPECTRUM ANALYSIS - SPUTTERING;
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学科分类号：
摘要：
Reactively sputtered metal oxide thin films are of importance in the fabrication of electro-optic devices. In order to design and engineer such devices, it is essential to measure and understand both the electrical and optical properties of these films. The results of experiments on several metal oxide thin films that were produced under a variety of sputtering conditions are reported (WO//x, Ni//xO//y, and Ta//xO//y).
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页码：584 / 586
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