Preparation of nanoporous silica films with low dielectric constant

被引:0
|
作者
Wang, Juan
Zhang, Changrui
Feng, Jian
机构
[1] State Key Lab of Novel Ceramic Fibers and Composites, National Univ. of Defense Technology, Changsha 410073, China
[2] State Key Lab of Novel Ceramic Fibers and Composites, College of Aerospace and Material Engineering, National Univ. of Defense Technology, Changsha 410073, China
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] High strength, low dielectric constant fluorinated silica xerogel films
    Gorman, BP
    Orozco-Teran, RA
    Roepsch, JA
    Dong, HJ
    Reidy, RF
    Mueller, DW
    APPLIED PHYSICS LETTERS, 2001, 79 (24) : 4010 - 4012
  • [22] Improvement of electrical properties of low dielectric constant nanoporous silica films prepared using sol–gel method with catalyst HF
    Z.W. He
    X.Q. Liu
    Q. Su
    Y.Y. Wang
    Applied Physics A, 2006, 82 : 349 - 355
  • [23] Quantitative structure and property analysis of nanoporous low dielectric constant SiCOH thin films
    Heo, Kyuyoung
    Park, Sung-Gyu
    Yoon, Jinhwan
    Jin, Kyeong Sik
    Jin, Sangwoo
    Rhee, Shi-Woo
    Ree, Moonhor
    JOURNAL OF PHYSICAL CHEMISTRY C, 2007, 111 (29): : 10848 - 10854
  • [24] Fluorinated nanoporous SiO2 films with ultra-low dielectric constant
    Zhen, C. M.
    Zhang, J. J.
    Zhang, Y. J.
    Liu, C. X.
    Pan, C. F.
    Hou, D. L.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (32) : 3867 - 3870
  • [25] Polyimide/fluorinated silica composite films with low dielectric constant and low water absorption
    Huang, Bingliang
    Li, Ke
    Peng, Mingyun
    Cheng, Jie
    HIGH PERFORMANCE POLYMERS, 2022, 34 (04) : 434 - 443
  • [26] Correlation between the dielectric constant and porosity of nanoporous silica thin films deposited by the gas evaporation technique
    Si, JJ
    Ono, H
    Uchida, K
    Nozaki, S
    Morisaki, H
    Itoh, N
    APPLIED PHYSICS LETTERS, 2001, 79 (19) : 3140 - 3142
  • [27] Improvement of electrical properties of low dielectric constant nanoporous silica films prepared using sol-gel method with catalyst HF
    He, ZW
    Liu, XQ
    Su, Q
    Wang, YY
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2006, 82 (02): : 349 - 355
  • [28] Low dielectric constant mesoporous silica films through molecularly templated synthesis
    Baskaran, S
    Liu, J
    Domansky, K
    Kohler, N
    Li, XH
    Coyle, C
    Fryxell, GE
    Thevuthasan, S
    Williford, RE
    ADVANCED MATERIALS, 2000, 12 (04) : 291 - 294
  • [29] Novel silica tube/polyimide composite films with variable low dielectric constant
    Zhang, YH
    Lu, SG
    Li, YQ
    Dang, ZM
    Xin, JH
    Fu, SY
    Li, GT
    Guo, RR
    Li, LF
    ADVANCED MATERIALS, 2005, 17 (08) : 1056 - +
  • [30] Integration Challenges of Nanoporous Low Dielectric Constant Materials
    Kim, Taek-Soo
    Dauskardt, Reinhold H.
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2009, 9 (04) : 509 - 515