Fabrication of 0.1 μm line-and -space patterns using soft x-ray reduction lithography

被引：0
|
作者：
Nagata, Hiroshi [1 ]
Ohtani, Masayuki [1 ]
Murakami, Katsuhiko [1 ]
Oshino, Tetsuya [1 ]
Oizumi, Hiroaki [1 ]
Maejima, Yuhihiko [1 ]
Watanable, Takeo [1 ]
Taguchi, Takao [1 ]
Yamashita, Yoshio [1 ]
Atoda, Nobufumi [1 ]
机构：
[1] Nikon Corp, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 1 A期
关键词：
Semiconductor devices;
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摘要：
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页码：360 / 363
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