LIF INVESTIGATIONS OF THE SURFACE CHEMISTRY IN THE DRY PROCESSING OF SEMICONDUCTOR DEVICES.

被引：0
|
作者：
Singh, O.N. [1 ]
Hopman, H.J. [1 ]
机构：
[1] FOM, Neth, FOM, Neth
来源：
Microelectronics Journal | 1987年 / 18卷 / 02期
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摘要：
45
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页码：39 / 47
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