Magnetic properties of carbonitride films elaborated by plasma enhanced chemical vapor deposition

被引：0

作者：

Trinquecoste, M. ^{[1
]}

Daguerre, E. ^{[1
]}

Couzin, L. ^{[1
]}

Amiell, J. ^{[1
]}

Derre, A. ^{[1
]}

Delhaes, P. ^{[1
]}

Ion, L. ^{[2
]}

Held, B. ^{[2
]}

机构：

[1] Ctr. Rech. Paul Pascal - C.N.R.S. U., Avenue du Docteur Albert Schweitzer, 33600 Pessac, France

[2] Lab. d'Electron. Gaz et des Plasmas, Univ. de Pau et des Pays de l'Adour, 64000 Pau, France

来源：

Carbon | / 37卷 / 03期

关键词：

Chlorine compounds - Doping (additives) - Heat treatment - High temperature effects - Magnetic properties - Nitrides - Plasma enhanced chemical vapor deposition;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Several amorphous carbonitride films have been elaborated by plasma enhanced chemical vapor deposition. A radio frequency discharge has been used under standard conditions with different graphitic nitrogenated compounds. It is shown that the influence of molecular precursor is important concerning in particular the magnetic properties. The films issued from pyrrole and cyanuric chloride exhibit a large number of spins. However, in contrast to previous works, no cooperative magnetic effects have been found at very low temperature. Finally, it is argued that a further heat-treatment at 1000 °C of a film, prepared from cyanuric chloride, seems to lead to a crystalline phase of C3N4.

引用

页码：457 / 462

共 50 条

[21] Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition
Shayapov, V. R.
Rumyantsev, Yu. M.
Plyusnin, P. E.
HIGH ENERGY CHEMISTRY, 2016, 50 (03) : 213 - 218
[22] Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor deposition
Awad, Y.
El Khakani, M. A.
Aktik, C.
Mouine, J.
Camire, N.
Lessard, M.
Scarlete, M.
Al-Abadleh, H. A.
Smirani, R.
SURFACE & COATINGS TECHNOLOGY, 2009, 204 (04): : 539 - 545
[23] Novel plasma enhanced chemical vapor deposition of highly conformal SiN films and their barrier properties
Lee, Woo-Jin
Choa, Yong-Ho
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2018, 36 (02):
[24] Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition
Yang, HS
Yoshida, T
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4): : 984 - 987
[25] Structural properties of SnxSy thin films prepared by plasma-enhanced chemical vapor deposition
Sanchez-Juarez, A
Ortiz, A
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (10) : 3708 - 3717
[26] Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane
Yu. M. Rumyantsev
N. I. Fainer
B. M. Ayupov
V. I. Rakhlin
Glass Physics and Chemistry, 2011, 37 : 316 - 321
[27] Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition
Aschwanden, R.
Kothernamn, R.
Albert, M.
Golla, C.
Meier, C.
THIN SOLID FILMS, 2021, 736
[28] TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS GROWN BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
WONG, MS
MEILUNAS, R
ONG, TP
CHANG, RPH
APPLIED PHYSICS LETTERS, 1989, 54 (20) : 2006 - 2008
[29] Physical and barrier properties of plasma enhanced chemical vapor deposition α-SiC:N:H films
Chiang, C.-C. (ccchiang.ee88g@nctu.edu.tw), 1600, Japan Society of Applied Physics (42):
[30] Optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition
Ali, Atif Mossad
OPTICAL MATERIALS, 2007, 30 (02) : 238 - 243

← 1 2 3 4 5 →