Model for high-rate film deposition from dusty RF discharges

被引：0
|
作者：
Dresden Univ of Technology, Dresden, Germany [1 ]
机构：
来源：
Surf Coat Technol | / 1 -3 pt 1卷 / 79-84期
关键词：
This work was supported by the German Ministry of Education and Research under contract number 0329563A and the Special Research Center Sensor Technology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
33
引用
收藏
相关论文
共 50 条
  • [31] NEW WAY FOR HIGH-RATE A-SI DEPOSITION
    BARDOS, L
    DUSEK, V
    VANECEK, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 : 281 - 284
  • [32] HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE
    JONES, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3088 - 3097
  • [33] High-rate deposition by microwave RPECVD at atmospheric pressure
    Cardoso, R. P.
    Belmonte, T.
    Kosior, F.
    Henrion, G.
    Tixhon, E.
    THIN SOLID FILMS, 2011, 519 (13) : 4177 - 4185
  • [34] High-rate deposition of protective coatings with a microwave plasma
    Merli, Stefan
    Schulz, Andreas
    Walker, Matthias
    Tovar, Günter
    Galvanotechnik, 2018, 109 (07): : 1426 - 1433
  • [35] Low-temperature and high-rate deposition of SrTiO3 thin films by RF magnetron sputtering
    Kohara, N
    Yoshida, A
    Sawada, T
    Kitagawa, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (01): : 172 - 177
  • [36] MODEL FOR CALCULATING DEPOSIT TEMPERATURE IN HIGH-RATE PHYSICAL-VAPOR-DEPOSITION PROCESS
    CHOW, R
    BUNSHAH, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (06): : VM73 - &
  • [37] DENSE-PLASMA PRODUCTION AND FILM DEPOSITION BY NEW HIGH-RATE SPUTTERING USING AN ELECTRIC MIRROR
    MATSUOKA, M
    ONO, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04): : 2652 - 2657
  • [38] Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors
    Menshakov, Andrey
    Bruhanova, Yulia
    Skorynina, Polina
    Medvedev, Anatoliy
    MEMBRANES, 2023, 13 (04)
  • [39] High-Rate Crystallization of Polycarbonate in Spincast Thin Film
    Ata, Seisuke
    Oka, Toshitaka
    He, Chun-Qing
    Ohdaira, Toshiyuki
    Suzuki, Ryouichi
    Ito, Kenji
    Kobayashi, Yoshinori
    Ougizawa, Toshiaki
    JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 2010, 48 (20) : 2148 - 2153
  • [40] High-rate deposition of high-quality silicon nitride film at room temperature by quasi-remote plasma chemical vapor deposition
    Suzuki, N
    Hayashi, S
    Masu, K
    Tsubouchi, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6824 - 6826
12345