Novel reactor concept for multiwafer growth of III-V semiconductors

被引：0
|
作者：
Beccard, R. [1 ]
Protzmann, H. [1 ]
Schmitz, D. [1 ]
Strauch, G. [1 ]
Heuken, M. [1 ]
Juergensen, H. [1 ]
机构：
[1] AIXTRON AG, Kackertstr. 15-17, D-52072 Aachen, Germany
来源：
Journal of Crystal Growth | 1999年 / 198-199卷 / pt 2期
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页码：1049 / 1055
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