Effect of substrate crystalline morphology on the adhesion of plasma enhanced chemical vapor deposited thin silicon oxide coatings on polyamide

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[1] Rochat, G.
[2] Leterrier, Y.
[3] Plummer, C.J.G.
[4] Manson, J.-A.E.
[5] Szoszkiewicz, R.
[6] Kulik, A.J.
[7] Fayet, P.
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Rochat, G. | 1600年 / American Institute of Physics Inc.卷 / 95期
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