CCVD: low-cost vapor-deposition of thin films in open atmosphere

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MicroCoating Technologies, Inc., 3901 Green Industrial Way, Chamblee, GA 30341, United States ^{[1
]}

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Mater Res Soc Symp Proc | / 255-260期

关键词：

Chemical vapor deposition - Combustion - Composition - Oxygen - Stoichiometry - Vacuum applications;

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[1] CCVD: Low-cost vapor-deposition of thin films in open atmosphere
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PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS, 1999, 555 : 255 - 260
[2] Combustion chemical vapor deposition: A low-cost, open atmosphere process for the deposition of high-quality thin films
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[3] PHYSICAL VAPOR-DEPOSITION OF THIN-FILMS
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[4] OPTIMIZATION OF A LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION REACTOR FOR THE DEPOSITION OF THIN-FILMS
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[8] PHOTOCHEMICAL VAPOR-DEPOSITION OF ALUMINUM THIN-FILMS
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[9] POLYMER THIN-FILMS PREPARED BY VAPOR-DEPOSITION
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[10] LOW-TEMPERATURE CHEMICAL PRECIPITATION AND VAPOR-DEPOSITION OF SNXS THIN-FILMS
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