Texture of aluminium and iron thin films and texture of bilayers Al/Fe deposited on silicon

被引：0
|
作者：
Tizliouine, A. [1 ]
Bessieres, J. [1 ]
Heizmann, J.J. [1 ]
Bobo, J.F. [1 ]
机构：
[1] Universite de Metz, Metz, France
来源：
Materials Science Forum | 1994年 / 157-6卷 / pt 2期
关键词：
Aluminum - Comminution - Deposition - Geometry - Iron - Semiconducting silicon - Structure (composition) - Textures - Vacuum applications - X ray analysis - X rays;
D O I：
10.4028/www.scientific.net/msf.157-162.1487
中图分类号：
学科分类号：
摘要：
Thin metallic layers and bilayers are used in electronic industry as well as protecting layers in metallurgy and glass industries. We present a study on aluminium and iron thin films deposited, by cathodic deposition in vacuum, on silicon wafer or iron sheet and bilayers Al/Fe also deposited on silicon. We show how the elaboration conditions, and mainly the Bias effect [1], influence the texture of thin films. Structural relationships between the substratum and the different layers are given.
引用
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页码：1487 / 1494
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