Texture of aluminium and iron thin films and texture of bilayers Al/Fe deposited on silicon

被引：0

作者：

Tizliouine, A. ^{[1
]}

Bessieres, J. ^{[1
]}

Heizmann, J.J. ^{[1
]}

Bobo, J.F. ^{[1
]}

机构：

[1] Universite de Metz, Metz, France

来源：

Materials Science Forum | 1994年 / 157-6卷 / pt 2期

关键词：

Aluminum - Comminution - Deposition - Geometry - Iron - Semiconducting silicon - Structure (composition) - Textures - Vacuum applications - X ray analysis - X rays;

D O I：

10.4028/www.scientific.net/msf.157-162.1487

中图分类号：

学科分类号：

摘要：

Thin metallic layers and bilayers are used in electronic industry as well as protecting layers in metallurgy and glass industries. We present a study on aluminium and iron thin films deposited, by cathodic deposition in vacuum, on silicon wafer or iron sheet and bilayers Al/Fe also deposited on silicon. We show how the elaboration conditions, and mainly the Bias effect [1], influence the texture of thin films. Structural relationships between the substratum and the different layers are given.

引用

页码：1487 / 1494

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