Effect of deposition conditions on the properties of TiN thin films prepared by filtered cathodic vacuum-arc technique

被引:0
|
作者
Tay, B.K. [1 ]
Shi, X. [1 ]
Yang, H.S. [1 ]
Tan, H.S. [1 ]
Chua, Daniel [1 ]
Teo, S.Y. [1 ]
机构
[1] Nanyang Technological Univ, Singapore, Singapore
来源
Surface and Coatings Technology | 1999年 / 111卷 / 2-3期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:229 / 233
相关论文
共 50 条
  • [41] Electro-optical and structural properties of thin ZnO films, prepared by filtered vacuum arc deposition
    David, T
    Goldsmith, S
    Boxman, RL
    THIN SOLID FILMS, 2004, 447 : 61 - 67
  • [42] A tribological study of tetrahedral amorphous carbon films prepared by filtered cathodic vacuum arc technique
    Yu, X
    Zhang, X
    Wang, CB
    Hua, M
    Wang, LG
    VACUUM, 2004, 75 (03) : 231 - 236
  • [43] Effect of deposition parameters on texture of TiN films deposited by filtered cathodic arc plasma
    Zhang, Yu-Juan
    Wu, Zhi-Guo
    Zhang, Wei-Wei
    Li, Xin
    Yan, Peng-Xun
    Liu, Wei-Min
    Xue, Qun-Ji
    Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals, 2004, 14 (08):
  • [44] Wear performance of tetrahedral amorphous carbon films prepared by filtered cathodic vacuum arc technique
    Zhang, X
    Yi, ZZ
    Zhang, TH
    Wu, XY
    Wang, GF
    Zhang, HX
    SURFACE & COATINGS TECHNOLOGY, 2002, 161 (2-3): : 120 - 124
  • [45] Tetrahedral amorphous carbon films by filtered cathodic vacuum-arc deposition for air-bearing-surface overcoat
    Inaba, H. (inaba@perl.hitachi.co.jp), 1600, Japan Society of Applied Physics (42):
  • [46] Filtered vacuum arc deposition of semiconductor thin films
    Boxman, RL
    Goldsmith, S
    BenShalom, A
    Kaplan, L
    Arbilly, D
    Gidalevich, E
    Zhitomirsky, V
    Ishaya, A
    Keidar, M
    Beilis, II
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1995, 23 (06) : 939 - 944
  • [47] Filtered vacuum arc deposition of semiconductor thin films
    Tel Aviv Univ, Tel Aviv, Israel
    IEEE Trans Plasma Sci, 6 (939-944):
  • [48] Influence of deposition temperature on the structure and internal stress of TiN films deposited by filtered cathodic vacuum arc
    Cheng, YH
    Tay, BK
    Lau, SP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (04): : 1270 - 1274
  • [49] Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon
    Bilek, MMM
    Milne, WI
    THIN SOLID FILMS, 1996, 290 : 299 - 304
  • [50] Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon
    Bilek, M.M.M.
    Milne, W.I.
    Thin Solid Films, 1996, 290-291 : 299 - 304