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- [43] Reactive fluorinated surfactant for step and flash imprint lithography JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 12 (03):
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- [46] Linewidth roughness characterization in step and flash imprint lithography PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
- [47] Controlling linewidth roughness in step and flash imprint lithography EMLC 2008: 24TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2008, 6792
- [48] Vinyl ether formulations for step and flash imprint lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06): : 2967 - 2971
- [49] Feature filling modeling for step and flash imprint lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (04): : 1926 - 1932