Template fabrication process in step and flash imprint lithography

被引：0
|
作者：
State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, China [1 ]
机构：
来源：
Hsi An Chiao Tung Ta Hsueh | 2006年 / 3卷 / 337-340期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Repair of step and flash imprint lithography templates
    Dauksher, WJ
    Nordquist, KJ
    Le, NV
    Gehoski, KA
    Mancini, DP
    Resnick, DJ
    Casoose, L
    Bozak, R
    White, R
    Csuy, J
    Lee, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 3306 - 3311
  • [32] Thermal analysis for step and flash imprint lithography during UV curing process
    Kim, EK
    Willson, CG
    MICROELECTRONIC ENGINEERING, 2006, 83 (02) : 213 - 217
  • [33] Mass fabrication of resistive random access crossbar arrays by step and flash imprint lithography
    Yun, Dae Keun
    Kim, Ki-Don
    Kim, Sungho
    Lee, Ji-Hye
    Park, Hyeong-Ho
    Jeong, Jun-Ho
    Choi, Yang-Kyu
    Choi, Dae-Geun
    NANOTECHNOLOGY, 2009, 20 (44)
  • [34] Initial study of the fabrication of step and flash imprint lithography templates for the printing of contact holes
    McMackin, I
    Schumaker, P
    Thompson, E
    Sreenivasan, SV
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (02): : 316 - 321
  • [35] Automated imprint mask cleaning for Step-and-Flash Imprint Lithography
    Singh, Sherjang
    Chen, Ssuwei
    Selinidis, Kosta
    Fletcher, Brian
    McMackin, Ian
    Thompson, Ecron
    Resnick, Douglas J.
    Dress, Peter
    Dietze, Uwe
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
  • [36] Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography
    Ruchhoeft, P
    Colburn, M
    Choi, B
    Nounu, H
    Johnson, S
    Bailey, T
    Damle, S
    Stewart, M
    Ekerdt, J
    Sreenivasan, SV
    Wolfe, JC
    Willson, CG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2965 - 2969
  • [37] Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography
    J Vac Sci Technol B Microelectron Nanometer Struct, (2965-2969):
  • [38] Kinetic parameters for step and flash imprint lithography photopolymerization
    Dickey, MD
    Willson, CG
    AICHE JOURNAL, 2006, 52 (02) : 777 - 784
  • [39] Photonic crystals from step and flash imprint lithography
    Taylor, J. Christopher
    Hostetler, Tim
    Kornilovich, Pavel
    Kramer, Ken
    EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151
  • [40] Reactive Fluorinated Surfactant for Step and Flash Imprint Lithography
    Ogawa, Tsuyoshi
    Hellebusch, Daniel J.
    Lin, Michael W.
    Jacobsson, B. Michael
    Bell, William
    Willson, C. Grant
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES III, 2011, 7970
12345