Film thickness monitoring with quartz wafer

被引：0

作者：

Department of Electronics and Information Engineering, Beijing Institute of Machinery, Beijing 100085, China ^{[1
]}

机构：

来源：

Zhenkong Kexue yu Jishu Xuebao | 2008年 / 5卷 / 437-440期

关键词：

Film thickness;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

共 50 条

[21] DETERMINATION OF QUARTZ RADIAL POTENTIAL FROM BALANCED FILM THICKNESS MEASUREMENTS OF QUARTZ SURFACES
CICHOS, C
SCHULZE, HJ
ESPIG, D
COLLOID AND POLYMER SCIENCE, 1976, 254 (07) : 670 - 671
[22] FILM THICKNESS MEASUREMENT BY MONITORING METHODS
GREAVES, C
VACUUM, 1970, 20 (08) : 332 - &
[23] MONITORING OF THIN FILM THICKNESS BY ELLIPSOMETRY
SIROHI, RS
APPLIED OPTICS, 1969, 8 (02): : 483 - &
[24] Monitoring Method of Optical Film Thickness
Zhuang Qiuhui
Wang Sanqiang
LASER & OPTOELECTRONICS PROGRESS, 2018, 55 (10)
[25] ACCURATE MONITORING OF DIELECTRIC FILM THICKNESS
HEAVENS, OS
KOPEK, GJ
YIFANG, Y
VACUUM, 1995, 46 (02) : 199 - 201
[26] MONITORING FILM THICKNESS IN COURCE OF DEPOSITION
LOGVINENKO, AG
BLYUMKIN.YA
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES-USSR, 1969, (05): : 1238 - +
[27] THIN-FILM THICKNESS MONITORING USING A DOUBLY OSCILLATING QUARTZ CRYSTAL AND MEASUREMENT OF GROWTH-RATE
KAUSHIK, DK
CHATTOPADHYAYA, SK
NATH, N
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1981, 14 (03): : 345 - 348
[28] In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography
Tay, Arthur
Ho, Weng Khuen
Wu, Xiaodong
Chen, Xiaoqi
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2009, 58 (12) : 3978 - 3984
[29] Quartz resonators for monitoring thin-fiilm mass and thickness
Gribova, LK
Savchenko, VE
Sorokin, AV
MEASUREMENT TECHNIQUES, 2005, 48 (02) : 146 - 150
[30] Temperature-corrected quartz-crystal microbalance for real-time film thickness monitoring in vacuum evaporation
Yamamoto, H.
Saiga, N.
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (9 A): : 4833 - 4838

← 1 2 3 4 5 →