MONITORING FILM THICKNESS IN COURCE OF DEPOSITION

被引：0
|
作者：
LOGVINENKO, AG
BLYUMKIN.YA
机构：
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES-USSR | 1969年 / 05期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1238 / +
页数：1
相关论文
共 50 条
  • [1] MONITORING FILM THICKNESS DURING A VACUUM DEPOSITION
    ALEKSANDROVICH, SV
    KOBANOV, NI
    OSAK, BF
    PARFENOVA, RI
    SKOMOROVSKII, VI
    SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1976, 43 (08): : 490 - 491
  • [2] SOLAR CELL THICKNESS MONITORING TECHNIQUE FOR THIN FILM DEPOSITION
    HUDSON, WR
    REYNOLDS, TW
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1971, 42 (07): : 1090 - &
  • [3] State of the art in thin film thickness and deposition rate monitoring sensors
    Buzea, C
    Robbie, K
    REPORTS ON PROGRESS IN PHYSICS, 2005, 68 (02) : 385 - 409
  • [4] REUSABLE QUARTZ CRYSTALS FOR THICKNESS MONITORING IN THIN-FILM DEPOSITION
    CHAO, WK
    WONG, HK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (01): : 150 - 151
  • [5] OPTICAL FILM THICKNESS MONITORING
    BEY, PP
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1971, 42 (01): : 57 - &
  • [6] Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness
    Yersak, Alexander S.
    Lee, Yung C.
    Spencer, Joseph A.
    Groner, Markus D.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (01):
  • [7] Film thickness monitoring with quartz wafer
    Department of Electronics and Information Engineering, Beijing Institute of Machinery, Beijing 100085, China
    Zhenkong Kexue yu Jishu Xuebao, 2008, 5 (437-440):
  • [8] FILM THICKNESS MEASUREMENT BY MONITORING METHODS
    GREAVES, C
    VACUUM, 1970, 20 (08) : 332 - &
  • [9] MONITORING OF THIN FILM THICKNESS BY ELLIPSOMETRY
    SIROHI, RS
    APPLIED OPTICS, 1969, 8 (02): : 483 - &
  • [10] Monitoring Method of Optical Film Thickness
    Zhuang Qiuhui
    Wang Sanqiang
    LASER & OPTOELECTRONICS PROGRESS, 2018, 55 (10)
12345