Coating and wear resistance of ceramic films from alkoxide solutions by atmosphere controlled thermal plasma CVD

被引:0
|
作者
Tsujino J. [1 ]
Yamazaki I. [2 ]
Shimada S. [3 ]
机构
[1] Hokkaido Electric Power Co., Inc., Ebetsu, Hokkaido 067-0033
[2] Hokkaido Sumiden Precision Co., Ltd., Hokkaido 079-0304, 776 Naie, Naie-cho
[3] Graduate School of Engineering, Hokkaido University, N13W8 Kita-ku
关键词
Alkoxide solutions; Nitrides; PSZ; Thermal plasma cvd; Wear resistance;
D O I
10.2497/jjspm.57.514
中图分类号
学科分类号
摘要
Monolithic and composite ceramic films of TiN, Ti-Al-N, Ti-B-C-N and PSZ were prepared at relatively higher deposition rate (approximately 100 nm/min) and at lower temperature (< 800C) by a novel thermal plasma CVD designed to spray Ti-, Al-, B-, or Zr-alkoxide solutions into ArZH2ZN2 thermal plasma. Chemical compositions of composite films were controlled by changing of mixing ratios of two kinds of alkoxide solutions and N2 flow rates. PSZ films were prepared by mild oxidation of Y- and Zr-alkoxide solutions with water introduced into the thermal Ar/N2 plasma without oxidation of under layer TiN. Cutting tests of composite TiBCN films deposited on WC-Co cutting tools exhibited better wear resistance compared with commercial TiN coated cutting tools.
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页码:514 / 519
页数:5
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