未找到相关数据
Si-DLC films using a plasma based ion implantation technique with positive-negative high voltage pulses (II) - Effect of positive pulse heights for thermal resistance, friction and wear
被引：0
|作者：
Materials Research Institute for Sustainable Development , National Institute of Advanced Industrial Science and Technology , 2266-98 Anagahora, Moriyama-ku, Nagoya 463-8560, Japan
[1
]
机构：
来源：
关键词：
Thin films;
D O I：
10.2497/jjspm.53.641
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文