Evaluation of absolute flux of vacuum ultraviolet photons in an electron cyclotron resonance hydrogen plasma: Comparison with ion flux

被引:0
|
作者
机构
[1] Zaima, Kazunori
[2] Kurihara, Kazuaki
[3] Sasaki, Koichi
来源
Zaima, K. | / Japan Society of Applied Physics卷 / 51期
关键词
Absolute intensity - Fabrication process - Plasma induced damage - Principal quantum numbers - Spectroscopic systems - Ultra large scale integrated circuits - Vacuum ultraviolets - Wavelength ranges;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] Oxygen atomic flux O-* enhancement by gas-pulsed electron cyclotron resonance plasma
    Park, YJ
    OKeeffe, P
    Ozasa, K
    Mutoh, H
    Aoyagi, Y
    Min, SK
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (05) : 2114 - 2118
  • [22] ION ACOUSTIC WAVES IN ELECTRON CYCLOTRON RESONANCE PLASMA
    SHOHET, JL
    PHYSICAL REVIEW A-GENERAL PHYSICS, 1964, 136 (1A): : A125 - &
  • [23] Ion and neutral temperatures in an electron cyclotron resonance plasma
    Yonesu, A
    Shinohara, S
    Yamashiro, Y
    Kawai, Y
    THIN SOLID FILMS, 2001, 390 (1-2) : 208 - 211
  • [24] ABSOLUTE PHOTON FLUX AND ANGULAR-DISTRIBUTION OF TOKYO SYNCHROTRON RADIATION IN VACUUM ULTRAVIOLET
    MASUOKA, T
    KITAMURA, K
    OSHIO, T
    NISHI, M
    ONUKI, H
    EJIRI, A
    MORIOKA, Y
    NAKAMURA, M
    NUCLEAR INSTRUMENTS & METHODS, 1978, 152 (01): : 219 - 223
  • [25] CHARACTERIZATION OF ELECTRON-CYCLOTRON-RESONANCE PLASMAS BY VACUUM-ULTRAVIOLET SPECTROSCOPY
    MEHLMAN, G
    EDDY, CR
    DOUGLASS, SR
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (11) : 6421 - 6426
  • [26] ION ENERGY-DISTRIBUTIONS AT THE ELECTRON-CYCLOTRON RESONANCE POSITION IN ELECTRON-CYCLOTRON RESONANCE PLASMA
    SAMUKAWA, S
    NAKAGAWA, Y
    IKEDA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (12): : L2319 - L2321
  • [27] ABSOLUTE PHOTON-FLUX AND ANGULAR-DISTRIBUTION OF TOKYO SYNCHROTRON RADIATION IN VACUUM ULTRAVIOLET
    MASUOKA, T
    OSHIO, T
    IWANAGA, R
    SONODA, H
    MORIOKA, Y
    NAKAMURA, M
    EJIRI, A
    ONUKI, H
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (08) : 1579 - 1580
  • [28] Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist
    Titus, M. J.
    Nest, D.
    Graves, D. B.
    APPLIED PHYSICS LETTERS, 2009, 94 (17)
  • [29] Enhanced confinement in electron cyclotron resonance ion source plasma
    Schachter, L.
    Stiebing, K. E.
    Dobrescu, S.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2010, 81 (02):