MTF Metrology for High-NA Microscope Objectives

被引:0
|
作者
Domenicau, Peter [1 ]
Fantone, Stephen D. [1 ]
机构
[1] Optikos Corp., United States
来源
Biophotonics International | 2009年 / 16卷 / 07期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
2
引用
收藏
页码:22 / 24
相关论文
共 50 条
  • [41] Polarizing assist features for high-NA optical lithography
    Chen, FT
    22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 1313 - 1323
  • [42] High-NA broadband achromatic metalens in the visible range
    Sun, XiaoHong
    Yan, MengMeng
    Huo, Shuang
    Fan, JiaJin
    Zhao, SaiLi
    Guo, RuiJun
    Zeng, Yong
    OPTICAL MATERIALS EXPRESS, 2023, 13 (09) : 2690 - 2698
  • [44] High-NA EUV projection lens with central obscuration
    Zhevlakov, A. P.
    Seisyan, R. P.
    Bespalov, V. G.
    Elizarov, V. V.
    Grishkanich, A. S.
    Kascheev, S. V.
    Bagdasarov, A. A.
    Sidorov, I. S.
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII, 2016, 9776
  • [45] High-NA EUV lithography optics becomes reality
    Ischmeier, Lars
    Graupner, Paul
    Kurz, Peter
    Kaiser, Winfried
    Van Schoot, Jan
    Mallmann, Jorg
    de Pee, Joost
    Stoeldra, Judon
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
  • [46] Experimental verification of high-NA imaging simulations using SHARP
    Davydova, Natalia
    Liu, Fei
    Benk, Markus
    van Setten, Eelco
    Bottiglieri, Gerardo
    van Oosten, Anton
    McNamara, John
    Wiaux, Vincent
    Franke, Joern-Holger
    Goldberg, Kenneth
    Nam, D. S.
    Zekry, Joseph
    Naulleau, Patrick
    Fliervoet, Timon
    Carpaij, Rene
    EXTREME ULTRAVIOLET LITHOGRAPHY 2020, 2020, 11517
  • [47] Polarization metrology for high numerical aperture DUV objectives
    Grejda, Robert D.
    Michaloski, Paul F.
    Spaulding, Duncan C.
    Mack, Stephen K.
    Michaels, Robert L.
    Dewa, Paul G.
    Aronstein, David L.
    MODELING ASPECTS IN OPTICAL METROLOGY VII, 2019, 11057
  • [48] High-NA, anamorphic or aspheric microlenses for telecommunications and data storage
    McIntyre, KJ
    Emmel, P
    Gretton, G
    Hagen, C
    Piscani, E
    Raguin, DH
    Sales, TRM
    OPTICS IN COMPUTING 2000, 2000, 4089 : 642 - 644
  • [49] Comparison of actinic lens characterization by arial image evaluation and interferometric testing for 157nm high-NA micro-objectives
    Schreiber, H
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 374 - 383
  • [50] Extruded polymer preforms for high-NA polymer microstructured fiber
    Ebendorff-Heidepriem, Heike
    Monro, Tanya
    van Eijkelenborg, Martijn A.
    Large, Maryanne J. C.
    2006 OPTICAL FIBER COMMUNICATION CONFERENCE/NATIONAL FIBER OPTIC ENGINEERS CONFERENCE, VOLS 1-6, 2006, : 1489 - +