共 50 条
- [41] Polarizing assist features for high-NA optical lithography 22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 1313 - 1323
- [44] High-NA EUV projection lens with central obscuration EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII, 2016, 9776
- [45] High-NA EUV lithography optics becomes reality EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
- [46] Experimental verification of high-NA imaging simulations using SHARP EXTREME ULTRAVIOLET LITHOGRAPHY 2020, 2020, 11517
- [47] Polarization metrology for high numerical aperture DUV objectives MODELING ASPECTS IN OPTICAL METROLOGY VII, 2019, 11057
- [48] High-NA, anamorphic or aspheric microlenses for telecommunications and data storage OPTICS IN COMPUTING 2000, 2000, 4089 : 642 - 644
- [49] Comparison of actinic lens characterization by arial image evaluation and interferometric testing for 157nm high-NA micro-objectives METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 374 - 383
- [50] Extruded polymer preforms for high-NA polymer microstructured fiber 2006 OPTICAL FIBER COMMUNICATION CONFERENCE/NATIONAL FIBER OPTIC ENGINEERS CONFERENCE, VOLS 1-6, 2006, : 1489 - +