Oxygen pressure and hydrophilicity of TiO2 films grown by reactive magnetron sputtering

被引:0
|
作者
Ba, Dechun [1 ]
Chang, Xuesen [1 ]
Wen, Lishi [2 ]
Liu, Kun [1 ]
机构
[1] Vacuum and Fluid Engineering Research Center, Northeastern University, Shenyang 110004, China
[2] Institute of Metal Material, Chinese Acad. of Sci., Shenyang 110015, China
关键词
Vacuum;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:155 / 158
相关论文
共 50 条
  • [21] Reactive sputtering TiO2 films
    Wang, Mingli
    Fan, Zhengxiu
    Zhongguo Jiguang/Chinese Journal of Lasers, 1996, 23 (11): : 991 - 994
  • [22] Cu/TiO2 thin films prepared by reactive RF magnetron sputtering
    M. Sreedhar
    I. Neelakanta Reddy
    Parthasarathi Bera
    D. Ramachandran
    K. Gobi Saravanan
    Arul Maximus Rabel
    C. Anandan
    P. Kuppusami
    J. Brijitta
    Applied Physics A, 2015, 120 : 765 - 773
  • [23] Sensitivity to humidity of TiO2 thin films obtained by reactive magnetron sputtering
    Radeva, E. I.
    Martev, I. N.
    Dechev, D. A.
    Ivanov, N.
    Tsaneva, V. N.
    Barber, Z. H.
    SURFACE & COATINGS TECHNOLOGY, 2006, 201 (06): : 2226 - 2229
  • [24] Optical and Electrical Properties of TiO2/Co/TiO2 Multilayer Films Grown by DC Magnetron Sputtering
    Valluzzi, Marcos G.
    Valluzzi, Lucas G.
    Meyer, Marcos
    Hernandez-Fenollosa, Maria A.
    Damonte, Laura C.
    ADVANCES IN CONDENSED MATTER PHYSICS, 2018, 2018
  • [25] The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering
    Sidelev, Dmitrii V.
    Yurjev, Yury N.
    Krivobokov, Valeriy P.
    Erofeev, Evgenii V.
    Penkova, Olga V.
    Novikov, Vadim A.
    VACUUM, 2016, 134 : 29 - 32
  • [26] Photo-induced hydrophilicity of SiOx:OH/TiO2 multi-layer films by direct current reactive magnetron sputtering
    Noguchi, D
    Sakai, T
    Nagatomo, T
    JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 2005, 113 (1321) : 630 - 633
  • [27] The effect of deposition parameters on the phase of TiO2 films grown by RF magnetron sputtering
    Ji Chon Lim
    Kyu Jeong Song
    Chan Park
    Journal of the Korean Physical Society, 2014, 65 : 1896 - 1902
  • [28] Surface Morphology of Heterogeneous Nanocrystalline Rutile/Amorphous Anatase TiO2 Films Grown by Reactive Pulsed Magnetron Sputtering
    Gago, Raul
    Vinnichenko, Mykola
    Redondo-Cubero, Andres
    Czigany, Zsolt
    Vazquez, Luis
    PLASMA PROCESSES AND POLYMERS, 2010, 7 (9-10) : 813 - 823
  • [29] The Effect of Deposition Parameters on the Phase of TiO2 Films Grown by RF Magnetron Sputtering
    Lim, Ji Chon
    Song, Kyu Jeong
    Park, Chan
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2014, 65 (11) : 1896 - 1902
  • [30] Structural and surface characteristics of TiO2 thin films grown by RF magnetron sputtering
    Lee, Bong-Ju
    Yoon, Youn-Saup
    Lee, Myung-Bok
    JOURNAL OF CERAMIC PROCESSING RESEARCH, 2019, 20 (04): : 418 - 423