The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering

被引：9

作者：

Sidelev, Dmitrii V. ^{[1
]}

Yurjev, Yury N. ^{[1
]}

Krivobokov, Valeriy P. ^{[1
]}

Erofeev, Evgenii V. ^{[2
]}

Penkova, Olga V. ^{[3
]}

Novikov, Vadim A. ^{[3
]}

机构：

[1] Natl Res Tomsk Polytech Univ, 30 Lenin Av, Tomsk 634050, Russia

[2] Tomsk State Univ Control Syst & Radioelect, 47 Vershinina Str, Tomsk 634034, Russia

[3] Natl Res Tomsk State Univ, 36 Lenin Av, Tomsk 634050, Russia

来源：

VACUUM | 2016年 / 134卷

关键词：

Dual magnetron sputtering; Dioxide titanium; Thin films; Photocatalytic activity; Optical properties; THIN-FILMS; TITANIA FILMS; DENSITY; RUTILE;

D O I：

10.1016/j.vacuum.2016.09.007

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials. (C) 2016 Elsevier Ltd. All rights reserved.

引用

页码：29 / 32

页数：4

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