Study on the thermal swelling of SU-8 photoresist in UV-LIGA technique

被引:0
|
作者
Key Lab. for Precision and Non-traditional Machining Technology, Dalian University of Technology, Dalian 116024, China [1 ]
不详 [2 ]
机构
来源
Yadian Yu Shengguang | 2008年 / 5卷 / 621-623期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] Contact UV lithography simulation for thick SU-8 photoresist
    Zhou, Zaifa
    Huang, Qing-An
    Li, Weihua
    Fen, Ming
    Lu, Wei
    Zhu, Zhen
    2006 IEEE SENSORS, VOLS 1-3, 2006, : 900 - +
  • [22] UV-LIGA工艺中SU-8光刻胶的热溶胀性研究
    杜立群
    朱神渺
    刘冲
    压电与声光, 2008, (05) : 621 - 623
  • [23] Fabrication of two-gimbal Ni–Fe torsional micro-gyroscope by SU-8 based UV-LIGA process
    Ankush Jain
    Chandra Shekhar
    Ram Gopal
    Microsystem Technologies, 2015, 21 : 1479 - 1487
  • [24] Indirect removal of SU-8 photoresist using PDMS technique
    Li, JH
    Chen, D
    Zhang, JY
    Liu, JQ
    Zhu, J
    SENSORS AND ACTUATORS A-PHYSICAL, 2006, 125 (02) : 586 - 589
  • [25] Microstructuring of SU-8 photoresist by UV-assisted thermal imprinting with non-transparent mold
    Youn, Sung-Won
    Ueno, Akihisa
    Takahashi, Masaharu
    Maeda, Ryutaro
    MICROELECTRONIC ENGINEERING, 2008, 85 (09) : 1924 - 1931
  • [26] Fabrication of two-gimbal Ni-Fe torsional micro-gyroscope by SU-8 based UV-LIGA process
    Jain, Ankush
    Shekhar, Chandra
    Gopal, Ram
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2015, 21 (07): : 1479 - 1487
  • [27] Fabrication of enclosed nanofluidic channels by UV cured imprinting and optimized thermal bonding of SU-8 photoresist
    Wang, Xudi
    Ge, Liangjin
    Lu, Jingjing
    Li, Xiaojun
    Qiu, Keqiang
    Tian, Yangchao
    Fu, Shaojun
    Cui, Zheng
    MICROELECTRONIC ENGINEERING, 2009, 86 (4-6) : 1347 - 1349
  • [28] Design, fabrication and characterization of a sheet-beam 140 GHz folded waveguide based on multi-step SU-8 UV-LIGA
    School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, China
    Qiangjiguang Yu Lizishu, 8
  • [29] Femtosecond optical curing of SU-8 photoresist
    Marble, Christopher B.
    Marble, Kassie S.
    Yakovlev, Vladislav V.
    ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS XIII, 2020, 11292
  • [30] Volume Hologram Formation in SU-8 Photoresist
    Sabel, Tina
    POLYMERS, 2017, 9 (06)