Effect of growth temperature on AlN films deposited by laser molecular beam epitaxy

被引：0
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作者：
Zhao, Dan [1 ]
Zhu, Jun [2 ]
Li, Yanrong [2 ]
机构：
[1] No.38 Institute of China Electrics Technology Group Corporation, Hefei 230088, China
[2] State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
来源：
Kuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society | 2011年 / 39卷 / 11期
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页码：1819 / 1824
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