Growth conditions and mechanical properties of a-C:H films

被引:0
|
作者
Northeastern University, Shenyang 110004, China [1 ]
机构
来源
Zhenkong Kexue yu Jishu Xuebao | 2008年 / 1卷 / 64-66期
关键词
9;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Metal-induced growth of graphene/a-C: H composite films and tribological properties
    Ling, Xiaoming
    Nie, Wenhao
    Wang, Weiqi
    Zhao, Xuan
    Lin, Xin
    DIAMOND AND RELATED MATERIALS, 2023, 133
  • [32] Relation between mechanical and structural properties of silicon-incorporated hard a-C:H films
    Universidade Federal do Rio de, Janeiro, Rio de Janeiro, Brazil
    Thin Solid Films, 1-2 (206-211):
  • [33] Relation between mechanical and structural properties of silicon-incorporated hard a-C:H films
    Neto, ALB
    Santos, RA
    Freire, FL
    Camargo, SS
    Carius, R
    Finger, F
    Beyer, W
    THIN SOLID FILMS, 1997, 293 (1-2) : 206 - 211
  • [34] Effect of a-C:H:Si interlayers on the mechanical and superlubricious properties of hydrogenated amorphous carbon films
    Zhang, Chenxi
    Deng, Wenli
    Xu, Jianxun
    Yu, Qingyuan
    Wang, Yinhui
    Tian, Jisen
    Li, Xuewu
    Qi, Wei
    Chen, Xinchun
    Zhang, Chenhui
    THIN SOLID FILMS, 2022, 753
  • [35] Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate
    Grenadyorov, A. S.
    Solovyev, A. A.
    Oskomov, K., V
    Zhulkov, M. O.
    TECHNICAL PHYSICS, 2021, 66 (10) : 1111 - 1117
  • [36] Mechanical, electrical and optical properties of a-C:H:N films deposited by plasma CVD technique
    Chakrabarti, K.
    Basu, M.
    Chaudhuri, S.
    Pal, A.K.
    Hanzawa, H.
    Vacuum, 1999, 53 (03): : 405 - 413
  • [37] Mechanical properties of hydrogen-free a-C:Si films
    Kulikovsky, V
    Vorlícek, V
    Bohác, P
    Kurdyumov, A
    Jastrabík, L
    DIAMOND AND RELATED MATERIALS, 2004, 13 (4-8) : 1350 - 1355
  • [38] Mechanical properties, thermal stability and oxidation resistance of HfC/a-C:H films deposited by HiPIMS
    Luo, Huan
    Sun, Hui
    Gao, Fei
    Billard, Alain
    Journal of Alloys and Compounds, 2021, 847
  • [39] Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate
    A. S. Grenadyorov
    A. A. Solovyev
    K. V. Oskomov
    M. O. Zhulkov
    Technical Physics, 2021, 66 : 1111 - 1117
  • [40] Structural and mechanical properties of nanocrystalline Zr co-sputtered a-C(:H) amorphous films
    Escudeiro, A.
    Figueiredo, N. M.
    Polcar, T.
    Cavaleiro, A.
    APPLIED SURFACE SCIENCE, 2015, 325 : 64 - 72