Plasma measurement of electron cyclotron resonance ion source for new materials production

被引：0

作者：

Tanaka K. ^{[1
]}

Uchida T. ^{[2
]}

Minezaki H. ^{[3
]}

Uchiyama H. ^{[1
]}

Asaji T. ^{[1
]}

Muramatsu M. ^{[4
]}

Kitagawa A. ^{[4
]}

Kato Y. ^{[5
]}

Yoshida Y. ^{[2
,3
]}

机构：

[1] Tateyama Machine Co., Ltd., Toyama 930-1305

[2] Bio-Nano Electronics Research Centre, Toyo University, Kawagoe, Saitama 350-8585

[3] Graduate School of Engineering, Toyo University, Kawagoe, Saitama 350-8585

[4] National Institute of Radiological Sciences (NIRS), Inage, Chiba 263-8555

[5] Division of Electrical Engineering, Osaka University, Suita, Osaka 565-0871

来源：

Journal of the Vacuum Society of Japan | 2010年 / 53卷 / 03期

关键词：

Ion beams - Electron cyclotron resonance - Plasma density - Ion sources;

D O I：

10.3131/jvsj2.53.169

中图分类号：

学科分类号：

摘要：

An electron cyclotron resonance ion source (ECRIS) has been designed and developed for a synthesis of new materials such as endohedral metallofullerenes. The plasma chamber diameter is 140 mm in order to produce large m/q ions, like singly charged C60 ions effectively. In this study, we examined the performance of our ECRIS by plasma measurements using a Langmuir probe. The plasma density increased with increasing Ar pressure and reached to 6.1 x 1017 m-3 at a pressure of 5.0 x 10-3 Pa. The plasma was produced over a large volume compared with conventional ECRISs.

引用

页码：169 / 171

页数：2

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