Analysis of printability of scratch defect on reflective mask in extreme ultraviolet lithography

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作者：
Association of Super-Advanced Electronic Technologies, EUV Process Technology Research Laboratory, C/o NTT Atsugi R and D Center, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan [1 ]
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来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 12期
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Journal article (JA)
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页码：9044 / 9052
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