Si-doped GaN/AlN quantum dot superlattices for optoelectronics at telecommunication wavelengths

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作者
Guillot, F. [1 ]
Bellet-Amalric, E. [1 ]
Monroy, E. [1 ]
Tchernycheva, M. [2 ]
Nevou, L. [2 ]
Doyennette, L. [2 ]
Julien, F.H. [2 ]
Dang, Le Si [3 ]
Remmele, T. [4 ]
Albrecht, M. [4 ]
Shibata, T. [5 ]
Tanaka, M. [5 ]
机构
[1] Equipe Mixte CEA-CNRS-UJF Nanophysique et Semiconducteurs, DRFMC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
[2] Action OptoGaN, Institut d'Electronique Fondamentale, UMR 8622 CNRS, 91405 Orsay Cedex, France
[3] Equipe Mixte CEA-CNRS-UJF Nanophysique et Semiconducteurs, Laboratoire de Spectrométrie Physique (CNRS UMR 5588), Université Joseph Fourier, 38402 Saint Martin d'Hères, France
[4] Institut für Kristallzüchtung, Max-Born-Strasse 2, D-12489 Berlin, Germany
[5] NGK Insulators, Ltd., 2-54 Sudacho, Mizuhoku, Nagoya, Japan
来源
Journal of Applied Physics | 2006年 / 100卷 / 04期
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