Reduction of random noise in complementary metal oxide semiconductor image sensors by gate oxide interface control

被引:0
|
作者
Jung, Jongwan [1 ]
Kwon, Doowon [2 ]
Lee, Duck-Hyung [2 ]
机构
[1] Department of Nano Science and Technology, Sejong University, 98 Gunja-dong, Gwangjin-gu, Seoul 143-747, Korea, Republic of
[2] Technology Development Team, Memory Division, Samsung Electronics Co., Ltd., San #24 Nongseo-Ri, Yongin-City, Gyeonggi-Do, 449-711, Korea, Republic of
关键词
Image sensors;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:3466 / 3469
相关论文
共 50 条
  • [41] Low-Standby-Power Complementary Metal-Oxide-Semiconductor Transistors with TiN Single Gate on 1.8 nm Gate Oxide
    Saito, Tomohiro
    Sekine, Katsuyuki
    Matsuo, Kouji
    Nakajima, Kazuaki
    Suguro, Kyoichi
    Tsunashima, Yoshitaka
    2003, Japan Society of Applied Physics (42):
  • [42] Subquarter-micrometer dual gate complementary metal oxide semiconductor field effect transistor with ultrathin gate oxide of 2 nm
    Shimizu, M
    Kuroi, T
    Inuishi, M
    Arima, H
    Abe, K
    Hamaguchi, C
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (11): : 5926 - 5931
  • [43] Subquarter-micrometer dual gate complementary metal oxide semiconductor field effect transistor with ultrathin gate oxide of 2 nm
    Shimizu, Masahiro
    Kuroi, Takashi
    Inuishi, Masahide
    Arima, Hideaki
    Abe, Haruhiko
    Hamaguchi, Chihiro
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (11): : 5926 - 5931
  • [44] Low-standby-power complementary metal-oxide-semiconductor transistors with TiN single gate on 1.8 nm gate oxide
    Saito, T
    Sekine, K
    Matsuo, K
    Nakajima, K
    Suguro, K
    Tsunashima, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2003, 42 (10A): : L1130 - L1132
  • [45] Complementary Metal Oxide Semiconductor Technology With and On Paper
    Martins, Rodrigo
    Nathan, Arokia
    Barros, Raquel
    Pereira, Luis
    Barquinha, Pedro
    Correia, Nuno
    Costa, Ricardo
    Ahnood, Arman
    Ferreira, Isabel
    Fortunato, Elvira
    ADVANCED MATERIALS, 2011, 23 (39) : 4491 - +
  • [46] Physical image properties of a complementary metal–oxide–semiconductor imager for mammography systems
    Okamoto C.
    Kodera Y.
    Radiological Physics and Technology, 2018, 11 (3) : 284 - 293
  • [47] Relating random telegraph signal noise in metal-oxide-semiconductor transistors to interface trap energy distribution
    van der Wel, AP
    Klumperink, EAM
    Hoekstra, E
    Nauta, B
    APPLIED PHYSICS LETTERS, 2005, 87 (18) : 1 - 3
  • [48] A new process technique for complementary metal-oxide-semiconductor [CMOS] compatible sensors
    Sheen, CS
    Chi, S
    SENSORS AND MATERIALS, 2001, 13 (01) : 57 - 66
  • [49] X-ray detection based on complementary metal-oxide-semiconductor sensors
    Cheng, Qian-Qian
    Ma, Chun-Wang
    Yuan, Yan-Zhong
    Wang, Fang
    Jin, Fu
    Liu, Xian-Feng
    NUCLEAR SCIENCE AND TECHNIQUES, 2019, 30 (01)
  • [50] Modeling and characterization of logarithmic complementary metal-oxide-semiconductor active pixel sensors
    Tabet, M
    Tu, N
    Hornsey, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (03): : 1006 - 1009