Growth of zno thin films on silicon substrates by atomic layer deposition

被引：4
|
作者：
Hussin, Rosniza [1 ,2 ]
Hou, Xianghui [1 ]
Choy, Kwang-Leong [1 ]
机构：
[1] Energy and Sustainability Research Division, Department Materials and Manufacturing Engineering, University of Nottingham NG7 2RD, United Kingdom
[2] University Tun Hussein Onn Malaysia (UTHM) 86400, Parit Raja Batu Pahat, Johor, Malaysia
来源：
Defect and Diffusion Forum | 2012年 / 329卷
关键词：
II-VI semiconductors - Semiconducting zinc compounds - Crystal atomic structure - Magnetic semiconductors - Oxide films - Substrates - Deionized water - Silicon wafers - Metallic films - Oxide semiconductors - Thin films - Atomic force microscopy - Atomic layer deposition - Film growth - Wide band gap semiconductors - Zinc sulfide;
D O I：
10.4028/www.scientific.net/DDF.329.159
中图分类号：
学科分类号：
摘要：
引用
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页码：159 / 164
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