Micro-fabrication and high-productivity etching system for 65-nm node and beyond

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Application Technology Department, Semiconductor Equipment Business Group, Hitachi High-Technologies Corporation ^{[1
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Hitachi Rev. | 2006年 / 2卷 / 83-87期

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[24] Advanced input/output technology using laterally modulated channel metal-oxide-semiconductor field effect transistor for 65-nm node system on a chip
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[26] Performance of novel 198.5nm wavelength mask inspection system for 65mn node and beyond optical lithography era
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[27] Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCANTM AT:1100B system for 100-nm applications
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[28] Advanced mask inspection optical system (AMOS) using 198.5nm wavelength for 65nm (hp) node and beyond - System development and initial state D/D inspection performance
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